Search results for “Chlorofluorocarbon” companies
Free sign up to view the full data
Key Players
Order by:
Innovation Intensity
With the analysis among 2,624 patents, we discovered top 484 key players by total patent application. EIDP, Inc., Glaxo Group Ltd., AGC, Inc. (Japan) are dominant in this area. They take 13.00% of the total patent filing.
EIDP, Inc.
Delaware, United States
Patent: 135
Glaxo Group Ltd.
Hounslow, United Kingdom
Patent: 122
AGC, Inc. (Japan)
Tokyo-to, Japan
Patent: 84
Honeywell International Technologies Ltd.
DUBLIN, Ireland
Patent: 59
Elf Atochem SA
France
Patent: 58
DAIKIN INDUSTRIES Ltd.
Osaka-fu, Japan
Patent: 47
BASF AB
Sweden
Patent: 46
Schering Corp.
New Jersey, United States
Patent: 44
Arkema, Inc.
Pennsylvania, United States
Patent: 38
Hitachi Ltd.
Tokyo-to, Japan
Patent: 37
Startups & Unicorns
Order by:
Innovation Intensity
With the analysis among 1 patents, we discovered top 1 start-ups by total patent application.
STARTUP
Tekna Plasma Systems, Inc.
Quebec, Canada
Patent: 1
Fast-Growing
Order by:
Innovation in recent 5 years
With the analysis among related 109 patents applied in the last 5 years. We discover 56 most active companies in this area. The fast-growing The Chemours Co., AGC, Inc. (Japan), Central Glass Co., Ltd. take 32.11% of patent filing during this period.
The Chemours Co.
Delaware, United States
Patent: 15
AGC, Inc. (Japan)
Tokyo-to, Japan
Patent: 14
Central Glass Co., Ltd.
Tokyo-to, Japan
Patent: 6
Quanzhou Yuji New Material Technology Co., Ltd.
Fujian Sheng, China
Patent: 4
Beijing Yuji Science & Technology Co., Ltd.
Beijing Shi, China
Patent: 4
Tokyo Electron Ltd.
Tokyo-to, Japan
Patent: 3
Paul Scherrer Institut PSI
Aargau, Switzerland
Patent: 3
The Yokohama Rubber Co., Ltd.
Tokyo-to, Japan
Patent: 3
SRF Ltd.
Haryana, India
Patent: 3
NOK Corp.
Tokyo-to, Japan
Patent: 2
New Entrants
Order by:
Innovation in recent 5 years
With the analysis among related 109 patents in last 5 years, we discover 39 new entrants. Quanzhou Yuji New Material Technology Co., Ltd., Paul Scherrer Institut PSI, SRF Ltd. are the most active new entrants in this area.
Quanzhou Yuji New Material Technology Co., Ltd.
Fujian Sheng, China
Patent: 4
Paul Scherrer Institut PSI
Aargau, Switzerland
Patent: 3
SRF Ltd.
Haryana, India
Patent: 3
Mingguang Speed Naide Solid Tire Co., Ltd.
Anhui Sheng, China
Patent: 1
Shanghai Fujia Fine Chemical Co Ltd.
Shanghai Shi, China
Patent: 1
Beijing North High-tech Co., Ltd.
Beijing Shi, China
Patent: 1
New Cosmos Electric Co., Ltd.
Osaka-fu, Japan
Patent: 1
Liming Chemical Research & Design Institute Co. Ltd.
Henan Sheng, China
Patent: 1
Nanjing Hero Arm Biotechnology Co., Ltd.
Jiangsu Sheng, China
Patent: 1
Xuzhou Ruima Intelligent Technology Co., Ltd.
Jiangsu Sheng, China
Patent: 1
Research Institutions
Order by:
Innovation Intensity
With the analysis among 89 patents, we discovered top 23 universities and scientific research institutions by total patent application. Xi'an Modern Chemistry Research Institute, Toyohashi University of Technology, Korea Advanced Institute of Science & Technology are dominant in this area. They take 23.60% of the total patent filing.
Xi'an Modern Chemistry Research Institute
Shaanxi Sheng, China
Patent: 4
Toyohashi University of Technology
Aichi-ken, Japan
Patent: 3
Korea Advanced Institute of Science & Technology
South Korea
Patent: 3
Virginia Commonwealth University
Virginia, United States
Patent: 2
Universiti Teknologi Malaysia
Johor, Malaysia
Patent: 2
Korea Institute of Science & Technology
South Korea
Patent: 2
Kansai University
Osaka-fu, Japan
Patent: 2
Council of Scientific & Industrial Research
Delhi, India
Patent: 1
Sun Yat-Sen University
Guangdong Sheng, China
Patent: 1
Keio University
Tokyo-to, Japan
Patent: 1
Keywords Quick Entry
Popular
Physics
Chemistry
Engineering
Materials science
Computer science
Biology
Medicine
MetalElectrodeVoltageSemiconductorPolymerElectricityCoatingFiberDisplay deviceRaw materialElectric motorUltimate tensile strengthNozzleCarbonBuilding constructionAlkylService lifeElectronOxideOxygenSolventControl unitFlangeControl systemDrugLight sourcePistonDiseaseElectric powerHigh pressure
View more
Page generation time: