Search results for “Silicon alkoxide” companies
Free sign up to view the full data
Key Players
Order by:
Innovation Intensity
With the analysis among 1,698 patents, we discovered top 358 key players by total patent application. Resonac Corp., Seiko Epson Corp., Nippon Sheet Glass Co., Ltd. are dominant in this area. They take 12.25% of the total patent filing.
Resonac Corp.
Tokyo-to, Japan
Patent: 106
Seiko Epson Corp.
Nagano-ken, Japan
Patent: 52
Nippon Sheet Glass Co., Ltd.
Tokyo-to, Japan
Patent: 50
Mitsubishi Materials Corp.
Tokyo-to, Japan
Patent: 49
Matsushita Electric Works Co. Ltd.
South Korea
Patent: 48
Tokuyama Corp.
Tokyo-to, Japan
Patent: 41
American Nano LLC
United States
Patent: 41
Eastman Kodak Co.
New York, United States
Patent: 40
Mitsubishi Kasei Corp.
Japan
Patent: 29
AGC, Inc. (Japan)
Tokyo-to, Japan
Patent: 26
Startups & Unicorns
Order by:
Innovation Intensity
With the analysis among 5 patents, we discovered top 1 start-ups by total patent application.
STARTUP
Aisin KK
Tokyo-to, Japan
Patent: 5
Fast-Growing
Order by:
Innovation in recent 5 years
With the analysis among related 162 patents applied in the last 5 years. We discover 56 most active companies in this area. The fast-growing American Nano LLC, Dowa Electronics Materials Co., Ltd., Dowa KK take 43.83% of patent filing during this period.
American Nano LLC
United States
Patent: 41
Dowa Electronics Materials Co., Ltd.
Tokyo-to, Japan
Patent: 20
Dowa KK
Japan
Patent: 10
Aica Kogyo Co., Ltd.
Aichi-ken, Japan
Patent: 7
Mitsubishi Materials Corp.
Tokyo-to, Japan
Patent: 6
Toppan, Inc.
Tokyo-to, Japan
Patent: 5
Fundación Tecnalia Research & Innovation
Spain
Patent: 5
Wanhua Chemical (Ningbo) Ltd.
Zhejiang Sheng, China
Patent: 4
Wanhua Chemical Group Co., Ltd.
Shandong Sheng, China
Patent: 4
National Formosa University
China
Patent: 3
New Entrants
Order by:
Innovation in recent 5 years
With the analysis among related 162 patents in last 5 years, we discover 33 new entrants. American Nano LLC, Dowa Electronics Materials Co., Ltd., Wanhua Chemical Group Co., Ltd. are the most active new entrants in this area.
American Nano LLC
United States
Patent: 41
Dowa Electronics Materials Co., Ltd.
Tokyo-to, Japan
Patent: 20
Wanhua Chemical Group Co., Ltd.
Shandong Sheng, China
Patent: 4
Wanhua Chemical (Ningbo) Ltd.
Zhejiang Sheng, China
Patent: 4
National Formosa University
China
Patent: 3
BYK-Chemie GmbH
Nordrhein-Westfalen, Germany
Patent: 2
UT-Battelle LLC
Tennessee, United States
Patent: 2
China Lucky Film Corp.
Hebei Sheng, China
Patent: 1
POSCO Future M Co., Ltd.
Gyeongsangbuk-do, South Korea
Patent: 1
Huizhou University
Guangdong Sheng, China
Patent: 1
Research Institutions
Order by:
Innovation Intensity
With the analysis among 189 patents, we discovered top 45 universities and scientific research institutions by total patent application. Nagoya Institute of Technology, Instituto Superior Técnico de Lisboa, Consejo Superior de Investigaciones Científicas are dominant in this area. They take 30.69% of the total patent filing.
Nagoya Institute of Technology
Aichi-ken, Japan
Patent: 16
Instituto Superior Técnico de Lisboa
Lisboa, Portugal
Patent: 7
Consejo Superior de Investigaciones Científicas
Madrid, Spain
Patent: 6
Université Pierre et Marie Curie
France
Patent: 5
The Hong Kong University of Science & Technology
Hong Kong SAR, China
Patent: 4
Mie University
Mie-ken, Japan
Patent: 4
University of Rochester
New York, United States
Patent: 3
Shinshu University
Nagano-ken, Japan
Patent: 3
Université des Sciences et Technologies de Lille
France
Patent: 3
National Formosa University
China
Patent: 3
Keywords Quick Entry
Popular
Physics
Chemistry
Engineering
Materials science
Computer science
Biology
Medicine
MetalElectrodeVoltageSemiconductorPolymerElectricityCoatingFiberDisplay deviceRaw materialElectric motorUltimate tensile strengthNozzleCarbonBuilding constructionAlkylService lifeElectronOxideOxygenSolventControl unitFlangeControl systemDrugLight sourcePistonDiseaseElectric powerHigh pressure
View more
Page generation time: